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2025/11/17 8:01:00


该系统选取ACM专利申请;;;さ乃降缍萍际,,,并支持铜、、镍、、锡银及金等多材质电镀工艺。!!F渲,,,铜电镀腔体建设了专为高凸柱利用设计的高速电镀桨叶,,,可能实现超过300微米的凸柱高度。!!ltra ECP ap-p设备选取四边密封干式接触卡盘以提升靠得住性,,,建设电镀腔内洗濯职能以最大限度削减分歧电镀腔之间的化学交叉传染,,,并选取水平电镀设计——通过同步旋转卡盘与旋转矩形电场实现卓越的膜厚均匀性。!!